文献
J-GLOBAL ID:201802220463330548
整理番号:18A1207068
パルス変調高密度プラズマを用いたCoFeB薄膜のナノメートルスケールエッチング【JST・京大機械翻訳】
Nanometer-scale etching of CoFeB thin films using pulse-modulated high density plasma
著者 (4件):
Cho Doo Hyeon
(Department of Chemistry and Chemical Engineering, Center for Design and Applications of Molecular Catalysts, Inha University, 100 Inharo, Nam-gu, Incheon 22212, South Korea)
,
Lee Jae Yong
(Department of Chemistry and Chemical Engineering, Center for Design and Applications of Molecular Catalysts, Inha University, 100 Inharo, Nam-gu, Incheon 22212, South Korea)
,
Choi Jae Sang
(Department of Chemistry and Chemical Engineering, Center for Design and Applications of Molecular Catalysts, Inha University, 100 Inharo, Nam-gu, Incheon 22212, South Korea)
,
Chung Chee Won
(Department of Chemistry and Chemical Engineering, Center for Design and Applications of Molecular Catalysts, Inha University, 100 Inharo, Nam-gu, Incheon 22212, South Korea)
資料名:
Current Applied Physics
(Current Applied Physics)
巻:
18
号:
9
ページ:
968-974
発行年:
2018年
JST資料番号:
W1579A
ISSN:
1567-1739
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)