文献
J-GLOBAL ID:201802223128112129
整理番号:18A1482261
(1010)サファイア上にスパッタした非極性(1010)AlN層の高温熱アニーリング【JST・京大機械翻訳】
High-temperature thermal annealing of nonpolar (10 1 0) AlN layers sputtered on (10 1 0) sapphire
著者 (6件):
Dinh Duc V.
(Institute of Materials and Systems for Sustainability, Nagoya University, Nagoya 464-8601, Japan)
,
Hu Nan
(School of Engineering, Nagoya University, Nagoya 464-8603, Japan)
,
Honda Yoshio
(Institute of Materials and Systems for Sustainability, Nagoya University, Nagoya 464-8601, Japan)
,
Amano Hiroshi
(Institute of Materials and Systems for Sustainability, Nagoya University, Nagoya 464-8601, Japan)
,
Amano Hiroshi
(Akasaki Research Center, Nagoya University, Nagoya 464-8603, Japan)
,
Pristovsek Markus
(Institute of Materials and Systems for Sustainability, Nagoya University, Nagoya 464-8601, Japan)
資料名:
Journal of Crystal Growth
(Journal of Crystal Growth)
巻:
498
ページ:
377-380
発行年:
2018年
JST資料番号:
B0942A
ISSN:
0022-0248
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)