文献
J-GLOBAL ID:201802227705990263
整理番号:18A0712019
マグネトロンスパッタリングにより作製したCu-Ta膜の電気的および熱的性質【JST・京大機械翻訳】
Electrical and thermal properties of Cu-Ta films prepared by magnetron sputtering
著者 (7件):
Qin Wen
(College of Material Science and Engineering, Hunan University, Changsha 410082, China)
,
Fu Licai
(College of Material Science and Engineering, Hunan University, Changsha 410082, China)
,
Zhu Jiajun
(College of Material Science and Engineering, Hunan University, Changsha 410082, China)
,
Yang Wulin
(College of Material Science and Engineering, Hunan University, Changsha 410082, China)
,
Sang Jianquan
(College of Material Science and Engineering, Hunan University, Changsha 410082, China)
,
Li Deyi
(College of Material Science and Engineering, Hunan University, Changsha 410082, China)
,
Zhou Lingping
(College of Material Science and Engineering, Hunan University, Changsha 410082, China)
資料名:
Applied Surface Science
(Applied Surface Science)
巻:
443
ページ:
97-102
発行年:
2018年
JST資料番号:
B0707B
ISSN:
0169-4332
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)