文献
J-GLOBAL ID:201802229115372439
整理番号:18A2160160
2Dホスホレン:電子デバイスのためのエピタキシャル成長と界面工学【JST・京大機械翻訳】
2D Phosphorene: Epitaxial Growth and Interface Engineering for Electronic Devices
著者 (11件):
Zhang Jia Lin
(Department of Chemistry, National University of Singapore, 3 Science Drive 3, 117543, Singapore)
,
Han Cheng
(SZU-NUS Collaborative Innovation Center for Optoelectronic Science and Technology, Shenzhen University, Shenzhen, 518060, China)
,
Han Cheng
(Department of Physics, National University of Singapore, 2 Science Drive 3, 117542, Singapore)
,
Hu Zehua
(Department of Physics, National University of Singapore, 2 Science Drive 3, 117542, Singapore)
,
Wang Li
(Institute for Advanced Study and Department of Physics, Nanchang University, 999 Xue Fu Da Dao, Nanchang, 330031, China)
,
Liu Lei
(State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, No. 3888 Dongnanhu Road, Changchun, 130033, China)
,
Wee Andrew T. S.
(Department of Physics, National University of Singapore, 2 Science Drive 3, 117542, Singapore)
,
Chen Wei
(Department of Chemistry, National University of Singapore, 3 Science Drive 3, 117543, Singapore)
,
Chen Wei
(SZU-NUS Collaborative Innovation Center for Optoelectronic Science and Technology, Shenzhen University, Shenzhen, 518060, China)
,
Chen Wei
(Department of Physics, National University of Singapore, 2 Science Drive 3, 117542, Singapore)
,
Chen Wei
(National University of Singapore (Suzhou) Research Institute, 377 Lin Quan Street, Suzhou Industrial Park, Jiang Su, 215123, China)
資料名:
Advanced Materials
(Advanced Materials)
巻:
30
号:
47
ページ:
e1802207
発行年:
2018年
JST資料番号:
W0001A
ISSN:
0935-9648
CODEN:
ADVMEW
資料種別:
逐次刊行物 (A)
記事区分:
文献レビュー
発行国:
ドイツ (DEU)
言語:
英語 (EN)