文献
J-GLOBAL ID:201802235287178827
整理番号:18A0446800
将来のCMOS技術のための低接触抵抗を用いた統合二重SPE過程【Powered by NICT】
Integrated dual SPE processes with low contact resistivity for future CMOS technologies
著者 (35件):
Wu Heng
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Seo Soon-Cheon
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Niu Chengyu
(IBM Semiconductor Technology Research, GLOBALFOUNDRIES Inc)
,
Wang Wei
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Tsutsui Gen
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Gluschenkov Oleg
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Liu Zuoguang
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Petrescu Alexandru
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Carr Adra
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Choi Sam
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Tsai Stan
(IBM Semiconductor Technology Research, GLOBALFOUNDRIES Inc)
,
Park Chanro
(IBM Semiconductor Technology Research, GLOBALFOUNDRIES Inc)
,
Seshadri Indira
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Desilva Anuja
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Arceo Abraham
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Yang George
(IBM Semiconductor Technology Research, GLOBALFOUNDRIES Inc)
,
Sankarapandian Muthumanickam
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Prindle Chris
(IBM Semiconductor Technology Research, GLOBALFOUNDRIES Inc)
,
Akarvardar Kerem
(IBM Semiconductor Technology Research, GLOBALFOUNDRIES Inc)
,
Durfee Curtis
(IBM Semiconductor Technology Research, GLOBALFOUNDRIES Inc)
,
Yang Jie
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Adusumilli Praneet
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Miao Bruce
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Strane Jay
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Kleemeier Walter
(IBM Semiconductor Technology Research, GLOBALFOUNDRIES Inc)
,
Raymond Mark
(IBM Semiconductor Technology Research, GLOBALFOUNDRIES Inc)
,
Choi Kisik
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Lie Fee-li
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Yamashita Tenko
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Knorr Andreas
(IBM Semiconductor Technology Research, GLOBALFOUNDRIES Inc)
,
Gupta Dinesh
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Guo Dechao
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Divakaruni Rama
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Bu Huiming
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
,
Khare Mukesh
(Albany Nanotechnology Center, 257 Fuller Road, Albany NY 12203, USA)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2017
号:
IEDM
ページ:
22.3.1-22.3.4
発行年:
2017年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)