文献
J-GLOBAL ID:201802240683881131
整理番号:18A0715763
Si酸化物基板上に堆積したAu膜の脱濡れ現象に及ぼす超薄Tiシード層の影響【JST・京大機械翻訳】
Influences of ultra-thin Ti seed layers on the dewetting phenomenon of Au films deposited on Si oxide substrates
著者 (6件):
Kamiko Masao
(Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan)
,
Kim So-Mang
(Department of Electronic Materials Engineering, Kwangwoon University, 447-1 Wolgye-Dong, Nowon-Gu, Seoul 139-701, South Korea)
,
Jeong Young-Seok
(Department of Electronic Materials Engineering, Kwangwoon University, 447-1 Wolgye-Dong, Nowon-Gu, Seoul 139-701, South Korea)
,
Ha Jae-Ho
(Department of Electronic Materials Engineering, Kwangwoon University, 447-1 Wolgye-Dong, Nowon-Gu, Seoul 139-701, South Korea)
,
Koo Sang-Mo
(Department of Electronic Materials Engineering, Kwangwoon University, 447-1 Wolgye-Dong, Nowon-Gu, Seoul 139-701, South Korea)
,
Ha Jae-Geun
(Department of Electronic Materials Engineering, Kwangwoon University, 447-1 Wolgye-Dong, Nowon-Gu, Seoul 139-701, South Korea)
資料名:
Physica E: Low-Dimensional Systems and Nanostructures
(Physica E: Low-Dimensional Systems and Nanostructures)
巻:
99
ページ:
320-329
発行年:
2018年
JST資料番号:
W1066A
ISSN:
1386-9477
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)