文献
J-GLOBAL ID:201802241844050473
整理番号:18A2029285
EUV,特殊構造体および3RD生成単一拡散ブレークによる最小FinFETおよび最小SRAMセルを特徴とする真の7nmプラットフォーム技術【JST・京大機械翻訳】
True 7nm Platform Technology featuring Smallest FinFET and Smallest SRAM cell by EUV, Special Constructs and 3rd Generation Single Diffusion Break
著者 (22件):
Jeong WC
(Semiconductor R&D Center, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Maeda S.
(Semiconductor R&D Center, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Lee HJ
(Semiconductor R&D Center, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Lee KW
(Semiconductor R&D Center, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Lee TJ
(Semiconductor R&D Center, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Park DW
(Semiconductor R&D Center, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Kim BS
(Semiconductor R&D Center, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Do JH
(Foundry Business, Samsung Electronics, San#16, Banweol-Dong, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Fukai T
(Semiconductor R&D Center, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Kwon DJ
(Semiconductor R&D Center, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Nam KJ
(Semiconductor R&D Center, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Rim WJ
(Foundry Business, Samsung Electronics, San#16, Banweol-Dong, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Jang MS
(Foundry Business, Samsung Electronics, San#16, Banweol-Dong, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Kim HT
(Foundry Business, Samsung Electronics, San#16, Banweol-Dong, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Lee YW
(Foundry Business, Samsung Electronics, San#16, Banweol-Dong, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Park JS
(Semiconductor R&D Center, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Lee EC
(Foundry Business, Samsung Electronics, San#16, Banweol-Dong, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Ha DW
(Semiconductor R&D Center, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Park C.H.
(Semiconductor R&D Center, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Cho H.-J.
(Semiconductor R&D Center, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Jung S.-M.
(Semiconductor R&D Center, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
,
Kang H.K.
(Semiconductor R&D Center, Hwasung-City, Gyeonggi-Do, 445-701, Republic of Korea)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2018
号:
VLSI Technology
ページ:
59-60
発行年:
2018年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)