文献
J-GLOBAL ID:201802244183707307
整理番号:18A1861545
ルチルおよび溶融シリカ基板上にスピンコートしたTiO_2薄膜の汚染【JST・京大機械翻訳】
Contamination of TiO2 thin films spin coated on rutile and fused silica substrates
著者 (8件):
Kabir I.I.
(School of Materials Science and Engineering, UNSW Sydney, Sydney, NSW 2052, Australia)
,
Sheppard L.R.
(School of Computing, Engineering & Mathematics, Western Sydney University, Locked Bag 1797, Penrith, NSW 2751, Australia)
,
Liu R.
(School of Computing, Engineering & Mathematics, Western Sydney University, Locked Bag 1797, Penrith, NSW 2751, Australia)
,
Yao Y.
(Mark Wainwright Analytical Centre, UNSW Sydney, Sydney, NSW 2052, Australia)
,
Zhu Q.
(Mark Wainwright Analytical Centre, UNSW Sydney, Sydney, NSW 2052, Australia)
,
Chen W.-F.
(School of Materials Science and Engineering, UNSW Sydney, Sydney, NSW 2052, Australia)
,
Koshy P.
(School of Materials Science and Engineering, UNSW Sydney, Sydney, NSW 2052, Australia)
,
Sorrell C.C.
(School of Materials Science and Engineering, UNSW Sydney, Sydney, NSW 2052, Australia)
資料名:
Surface & Coatings Technology
(Surface & Coatings Technology)
巻:
354
ページ:
369-382
発行年:
2018年
JST資料番号:
D0205C
ISSN:
0257-8972
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)