文献
J-GLOBAL ID:201802244218941424
整理番号:18A0446792
はんだリフローのための認定された埋め込まれた垂直STT-MRAM技術に及ぼす外部磁場の影響【Powered by NICT】
Impact of external magnetic field on embedded perpendicular STT-MRAM technology qualified for solder reflow
著者 (20件):
Wang Chia-Yu
(Taiwan Semiconductor Manufacturing Company, 121, Park Ave. 3, Hsinchu Science Park, Taiwan 300)
,
Shih Meng-Chun
(Taiwan Semiconductor Manufacturing Company, 121, Park Ave. 3, Hsinchu Science Park, Taiwan 300)
,
Lee Yung-Huei
(Taiwan Semiconductor Manufacturing Company, 121, Park Ave. 3, Hsinchu Science Park, Taiwan 300)
,
Wang Wayne
(Taiwan Semiconductor Manufacturing Company, 121, Park Ave. 3, Hsinchu Science Park, Taiwan 300)
,
Thomas Luc
(TDK-Headway Technologies, Inc., Milpitas, CA 95035)
,
Lee Yuan-Jen
(TDK-Headway Technologies, Inc., Milpitas, CA 95035)
,
Liu Huanlong
(TDK-Headway Technologies, Inc., Milpitas, CA 95035)
,
Zhu Jian
(TDK-Headway Technologies, Inc., Milpitas, CA 95035)
,
Jan Guenole
(TDK-Headway Technologies, Inc., Milpitas, CA 95035)
,
Wang Allen
(TDK-Headway Technologies, Inc., Milpitas, CA 95035)
,
Zhong Tom
(TDK-Headway Technologies, Inc., Milpitas, CA 95035)
,
Wang Po-Kang
(TDK-Headway Technologies, Inc., Milpitas, CA 95035)
,
Lin Derek
(Taiwan Semiconductor Manufacturing Company, 121, Park Ave. 3, Hsinchu Science Park, Taiwan 300)
,
Chen Chia-Hsiang
(Taiwan Semiconductor Manufacturing Company, 121, Park Ave. 3, Hsinchu Science Park, Taiwan 300)
,
Chang Chih-Yang
(Taiwan Semiconductor Manufacturing Company, 121, Park Ave. 3, Hsinchu Science Park, Taiwan 300)
,
Weng Chih-Hui
(Taiwan Semiconductor Manufacturing Company, 121, Park Ave. 3, Hsinchu Science Park, Taiwan 300)
,
Chiang Tien-Wei
(Taiwan Semiconductor Manufacturing Company, 121, Park Ave. 3, Hsinchu Science Park, Taiwan 300)
,
Shen Kuei-Hung
(Taiwan Semiconductor Manufacturing Company, 121, Park Ave. 3, Hsinchu Science Park, Taiwan 300)
,
Gallagher William J.
(Taiwan Semiconductor Manufacturing Company, 121, Park Ave. 3, Hsinchu Science Park, Taiwan 300)
,
Chuang Harry
(Taiwan Semiconductor Manufacturing Company, 121, Park Ave. 3, Hsinchu Science Park, Taiwan 300)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2017
号:
IEDM
ページ:
21.1.1-21.1.4
発行年:
2017年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)