文献
J-GLOBAL ID:201802244830084684
整理番号:18A0426507
内部と外部炭素源の相乗作用による6H-SiCのSi面上のグラフェンの新しい直接成長法【Powered by NICT】
A new direct growth method of graphene on Si-face of 6H-SiC by synergy of the inner and external carbon sources
著者 (9件):
Yang Zhiyuan
(State Key Laboratory of Crystal Materials, Shandong University, Jinan, 250100, PR China)
,
Xu Shicai
(Shandong Provincial Key Laboratory of Biophysics, College of Physics and Electronic Information, Dezhou University, Dezhou, 253023, PR China)
,
Zhao Lili
(State Key Laboratory of Crystal Materials, Shandong University, Jinan, 250100, PR China)
,
Zhang Jing
(Shandong Provincial Key Laboratory of Biophysics, College of Physics and Electronic Information, Dezhou University, Dezhou, 253023, PR China)
,
Wang Zhengping
(State Key Laboratory of Crystal Materials, Shandong University, Jinan, 250100, PR China)
,
Chen Xiufang
(State Key Laboratory of Crystal Materials, Shandong University, Jinan, 250100, PR China)
,
Cheng Xiufeng
(State Key Laboratory of Crystal Materials, Shandong University, Jinan, 250100, PR China)
,
Yu Fapeng
(State Key Laboratory of Crystal Materials, Shandong University, Jinan, 250100, PR China)
,
Zhao Xian
(State Key Laboratory of Crystal Materials, Shandong University, Jinan, 250100, PR China)
資料名:
Applied Surface Science
(Applied Surface Science)
巻:
436
ページ:
511-518
発行年:
2018年
JST資料番号:
B0707B
ISSN:
0169-4332
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)