文献
J-GLOBAL ID:201802245451467219
整理番号:18A0998897
熱放射誘起局所リフローによるPMMAの表面粗さを低減するための効果的アプローチ【JST・京大機械翻訳】
An effective approach for reducing surface roughness of PMMA by thermal radiation induced local reflow
著者 (4件):
Xu Chen
(Nanolithography and Application Research Group, State Key Lab of Asic and System, School of Information Science and Engineering, Fudan University, Shanghai 200433, China)
,
Zhang Sichao
(Nanolithography and Application Research Group, State Key Lab of Asic and System, School of Information Science and Engineering, Fudan University, Shanghai 200433, China)
,
Shao Jinhai
(Nanolithography and Application Research Group, State Key Lab of Asic and System, School of Information Science and Engineering, Fudan University, Shanghai 200433, China)
,
Chen Yifang
(Nanolithography and Application Research Group, State Key Lab of Asic and System, School of Information Science and Engineering, Fudan University, Shanghai 200433, China)
資料名:
Microelectronic Engineering
(Microelectronic Engineering)
巻:
196
ページ:
1-6
発行年:
2018年
JST資料番号:
C0406B
ISSN:
0167-9317
CODEN:
MIENEF
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)