文献
J-GLOBAL ID:201802248573470124
整理番号:18A0110584
Formation of silicon carbide defect qubits with optically transparent electrodes and atomic layer deposited silicon oxide surface passivation
著者 (19件):
NAYFEH O.M.
(SPAWAR Systems Center Pacific, CA, USA)
,
HIGA B.
(SPAWAR Systems Center Pacific, CA, USA)
,
LIU B.
(SPAWAR Systems Center Pacific, CA, USA)
,
SIMS P.
(SPAWAR Systems Center Pacific, CA, USA)
,
TORRES C.
(SPAWAR Systems Center Pacific, CA, USA)
,
DAVIDSON B.
(SPAWAR Systems Center Pacific, CA, USA)
,
LERUM L.
(SPAWAR Systems Center Pacific, CA, USA)
,
ROMERO H.
(SPAWAR Systems Center Pacific, CA, USA)
,
FAHEM M.
(SPAWAR Systems Center Pacific, CA, USA)
,
LASHER M.
(SPAWAR Systems Center Pacific, CA, USA)
,
BARUA R.
(SPAWAR Systems Center Pacific, CA, USA)
,
DEESCOBAR A.
(SPAWAR Systems Center Pacific, CA, USA)
,
COTHERN J.
(SPAWAR Systems Center Pacific, CA, USA)
,
SIMONSEN K.
(SPAWAR Systems Center Pacific, CA, USA)
,
RAMIREZ A.D.
(SPAWAR Systems Center Pacific, CA, USA)
,
BANKS H.
(US Naval Res. Lab, Washington, DC, USA)
,
CARTER S.G.
(US Naval Res. Lab, Washington, DC, USA)
,
GASKILL D.K.
(US Naval Res. Lab, Washington, DC, USA)
,
REINECKE T.L.
(US Naval Res. Lab, Washington, DC, USA)
資料名:
Proceedings of SPIE
(Proceedings of SPIE)
巻:
10358
ページ:
103580I.1-103580I.11
発行年:
2017年
JST資料番号:
D0943A
ISSN:
0277-786X
CODEN:
PSISDG
資料種別:
会議録 (C)
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)