文献
J-GLOBAL ID:201802251182511824
整理番号:18A1025410
シリコン光電池のためのシリコン基板上の自己集合障壁層を有する大気焼結銅基合金応用膜【JST・京大機械翻訳】
Atmospherically sintered copper-base alloy application film with self-assembled barrier layer on silicon substrate for silicon photovoltaics
著者 (6件):
Adachi Shuichiro
(Research & Innovation Promotion Headquarters, Hitachi Chemical Company, Ltd., Tsukuba City 300-4247, Japan)
,
Nojiri Takeshi
(Research & Innovation Promotion Headquarters, Hitachi Chemical Company, Ltd., Tsukuba City 300-4247, Japan)
,
Kato Takahiko
(Marketing & Sales Unit, Analysis, Testing & Research Business, Kobelco Research Institute, Inc., Tokyo, 141-0032, Japan)
,
Kato Takahiko
(Center for Advanced Research of Energy and Materials, Faculty of Engineering, Hokkaido University, Sapporo City 060-8628, Japan)
,
Watanabe Seiichi
(Center for Advanced Research of Energy and Materials, Faculty of Engineering, Hokkaido University, Sapporo City 060-8628, Japan)
,
Yoshida Masato
(Life Science Business Headquarters, Hitachi Chemical Company, Ltd., Tokyo 100-6606, Japan)
資料名:
Journal of Alloys and Compounds
(Journal of Alloys and Compounds)
巻:
757
ページ:
333-339
発行年:
2018年
JST資料番号:
D0083A
ISSN:
0925-8388
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)