文献
J-GLOBAL ID:201802251927645761
整理番号:18A2218089
水素化非晶質炭素膜の耐食性に及ぼすSi混入の影響【JST・京大機械翻訳】
Effect of Si incorporation on corrosion resistance of hydrogenated amorphous carbon film
著者 (6件):
Nishikawa Jumpei
(Department of Mechanical Engineering, School of Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8552, Japan)
,
Sugihara Naoki
(Department of Mechanical Engineering, School of Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8552, Japan)
,
Nakano Masayuki
(Department of Chemical Science and Engineering, National Institute of Technology, Tokyo College, 1220-2 Kunugida, Hachioji, Tokyo 193-0997, Japan)
,
Hieda Junko
(Department of Chemical Systems Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan)
,
Ohtake Naoto
(Laboratory for Future Interdisciplinary Research of Science and Technology (FIRST), Institute of Innovative Research (IIR), Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama, Kanagawa 226-8503, Japan)
,
Akasaka Hiroki
(Department of Mechanical Engineering, School of Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8552, Japan)
資料名:
Diamond and Related Materials
(Diamond and Related Materials)
巻:
90
ページ:
207-213
発行年:
2018年
JST資料番号:
W0498A
ISSN:
0925-9635
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)