文献
J-GLOBAL ID:201802252584378584
整理番号:18A0795956
ヘキサフルオロアンチモン酸塩を含むハイブリッドフォトレジストの高分解能EUVLパターンの増強された機械的性質【JST・京大機械翻訳】
Enhanced mechanical properties of the high-resolution EUVL patterns of hybrid photoresists containing hexafluoroantimonate
著者 (6件):
Kumar Pawan
(School of Computing and Electrical Engineering, Indian Institute of Technology (IIT)-Mandi, H.P. 175005, India)
,
Reddy Pulikanti Guruprasad
(School of Basic Science, Indian Institute of Technology (IIT)-Mandi, H.P. 175005, India)
,
Sharma Satinder K.
(School of Computing and Electrical Engineering, Indian Institute of Technology (IIT)-Mandi, H.P. 175005, India)
,
Ghosh Subrata
(School of Basic Science, Indian Institute of Technology (IIT)-Mandi, H.P. 175005, India)
,
Pradeep Chullikkattil P.
(School of Basic Science, Indian Institute of Technology (IIT)-Mandi, H.P. 175005, India)
,
Gonsalves Kenneth E.
(School of Basic Science, Indian Institute of Technology (IIT)-Mandi, H.P. 175005, India)
資料名:
Microelectronic Engineering
(Microelectronic Engineering)
巻:
194
ページ:
100-108
発行年:
2018年
JST資料番号:
C0406B
ISSN:
0167-9317
CODEN:
MIENEF
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)