文献
J-GLOBAL ID:201802254755938189
整理番号:18A1711702
多段階低速アニーリング戦略による強化ペロブスカイトフォトトランジスタ【JST・京大機械翻訳】
Enhanced perovskite phototransistor by multi-step slow annealing strategy
著者 (14件):
Cao Mingxuan
(Department of Electrical and Electronic Engineering, Southern University of Science and Technology, Shenzhen, 518055, China)
,
Cao Mingxuan
(Key Laboratory of Opto-Electronics Information Technology (Tianjin University), Ministry of Education, School of Precision Instruments and Opto-Electronics Engineering, and Opto-Electronics Engineering, Tianjin University, Tianjin, 300072, China)
,
Zhang Yating
(Department of Electrical and Electronic Engineering, Southern University of Science and Technology, Shenzhen, 518055, China)
,
Zhang Yating
(Key Laboratory of Opto-Electronics Information Technology (Tianjin University), Ministry of Education, School of Precision Instruments and Opto-Electronics Engineering, and Opto-Electronics Engineering, Tianjin University, Tianjin, 300072, China)
,
Yu Yu
(Department of Electrical and Electronic Engineering, Southern University of Science and Technology, Shenzhen, 518055, China)
,
Yu Yu
(Key Laboratory of Opto-Electronics Information Technology (Tianjin University), Ministry of Education, School of Precision Instruments and Opto-Electronics Engineering, and Opto-Electronics Engineering, Tianjin University, Tianjin, 300072, China)
,
Jin Lufan
(Key Laboratory of Opto-Electronics Information Technology (Tianjin University), Ministry of Education, School of Precision Instruments and Opto-Electronics Engineering, and Opto-Electronics Engineering, Tianjin University, Tianjin, 300072, China)
,
Li Yifan
(Key Laboratory of Opto-Electronics Information Technology (Tianjin University), Ministry of Education, School of Precision Instruments and Opto-Electronics Engineering, and Opto-Electronics Engineering, Tianjin University, Tianjin, 300072, China)
,
Chen Zhiliang
(Key Laboratory of Opto-Electronics Information Technology (Tianjin University), Ministry of Education, School of Precision Instruments and Opto-Electronics Engineering, and Opto-Electronics Engineering, Tianjin University, Tianjin, 300072, China)
,
Che Yongli
(Key Laboratory of Opto-Electronics Information Technology (Tianjin University), Ministry of Education, School of Precision Instruments and Opto-Electronics Engineering, and Opto-Electronics Engineering, Tianjin University, Tianjin, 300072, China)
,
Dai Haitao
(Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, School of Science, Tianjin University, Tianjin, 300072, China)
,
Zhang Guizhong
(Key Laboratory of Opto-Electronics Information Technology (Tianjin University), Ministry of Education, School of Precision Instruments and Opto-Electronics Engineering, and Opto-Electronics Engineering, Tianjin University, Tianjin, 300072, China)
,
Yao Jianquan
(Department of Electrical and Electronic Engineering, Southern University of Science and Technology, Shenzhen, 518055, China)
,
Yao Jianquan
(Key Laboratory of Opto-Electronics Information Technology (Tianjin University), Ministry of Education, School of Precision Instruments and Opto-Electronics Engineering, and Opto-Electronics Engineering, Tianjin University, Tianjin, 300072, China)
資料名:
Optical Materials
(Optical Materials)
巻:
84
ページ:
498-503
発行年:
2018年
JST資料番号:
W0468A
ISSN:
0925-3467
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)