文献
J-GLOBAL ID:201802256399653114
整理番号:18A0431827
反応性パルスレーザ蒸着中のN_2圧力で同調させたFeCoAlON膜の微細構造と電磁性能【Powered by NICT】
Microstructure and electromagnetic performance of the FeCoAlON films tuned by N2 pressure during reactive pulsed laser deposition
著者 (4件):
Bai Guohua
(School of Materials Science and Engineering, State Key Laboratory of Silicon Materials, Key Laboratory of Novel Materials for Information Technology of Zhejiang Province, Zhejiang University, Hangzhou 310027, China)
,
Jin Jiaying
(School of Materials Science and Engineering, State Key Laboratory of Silicon Materials, Key Laboratory of Novel Materials for Information Technology of Zhejiang Province, Zhejiang University, Hangzhou 310027, China)
,
Wu Chen
(School of Materials Science and Engineering, State Key Laboratory of Silicon Materials, Key Laboratory of Novel Materials for Information Technology of Zhejiang Province, Zhejiang University, Hangzhou 310027, China)
,
Yan Mi
(School of Materials Science and Engineering, State Key Laboratory of Silicon Materials, Key Laboratory of Novel Materials for Information Technology of Zhejiang Province, Zhejiang University, Hangzhou 310027, China)
資料名:
Journal of Alloys and Compounds
(Journal of Alloys and Compounds)
巻:
739
ページ:
866-872
発行年:
2018年
JST資料番号:
D0083A
ISSN:
0925-8388
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)