文献
J-GLOBAL ID:201802259205366958
整理番号:18A0424138
イオン源支援マグネトロンスパッタリングによるナノ結晶Al_2O_3膜の低温蒸着【Powered by NICT】
Low-temperature deposition of nanocrystalline Al2O3 films by ion source-assisted magnetron sputtering
著者 (7件):
Ding Ji Cheng
(Global Frontier R&D Center for Hybrid Interface Materials, Pusan National University, Busan, 609-735, South Korea)
,
Zhang Teng Fei
(Global Frontier R&D Center for Hybrid Interface Materials, Pusan National University, Busan, 609-735, South Korea)
,
Mane Rajaram S.
(Global Frontier R&D Center for Hybrid Interface Materials, Pusan National University, Busan, 609-735, South Korea)
,
Kim Kwang-Ho
(Global Frontier R&D Center for Hybrid Interface Materials, Pusan National University, Busan, 609-735, South Korea)
,
Kang Myung Chang
(Global Frontier R&D Center for Hybrid Interface Materials, Pusan National University, Busan, 609-735, South Korea)
,
Zou Chang Wei
(School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou, 510006, China)
,
Wang Qi Min
(School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou, 510006, China)
資料名:
Vacuum
(Vacuum)
巻:
149
ページ:
284-290
発行年:
2018年
JST資料番号:
E0347A
ISSN:
0042-207X
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)