文献
J-GLOBAL ID:201802260088392999
整理番号:18A1028375
SiOx不動態化ペーストを用いたSiNx反射防止膜の不動態化と反射率均一性の改善【JST・京大機械翻訳】
Improving the passivation and the reflectance uniformity of SiNx anti-reflection coating by using the SiOx passivation paste
著者 (8件):
Lin Yung-Sheng
(E-Ton Solar Tech Co., LTD., No.498, Sec. 2, Bentian Road, An-Nan Dist., Tainan, 70955, Taiwan, R.O.C.)
,
Hung Jui-Yi
(New E Materials Co., LTD., 2F, No. 3, Luke 1st Rd., Luzhu Dist., Kaohsiung City 82151, Taiwan, R.O.C.)
,
Ku Chen-Hao
(E-Ton Solar Tech Co., LTD., No.498, Sec. 2, Bentian Road, An-Nan Dist., Tainan, 70955, Taiwan, R.O.C.)
,
Chen Tsung-Cheng
(E-Ton Solar Tech Co., LTD., No.498, Sec. 2, Bentian Road, An-Nan Dist., Tainan, 70955, Taiwan, R.O.C.)
,
Lin Chun-Fu
(E-Ton Solar Tech Co., LTD., No.498, Sec. 2, Bentian Road, An-Nan Dist., Tainan, 70955, Taiwan, R.O.C.)
,
Wang Jung-Ching
(Eternal Chemical Co., LTD., No. 22, Changhsing Road, Luchu District, Kaohsiung 821, Taiwan, R.O.C.)
,
Hu Cheng-Shun
(E-Ton Solar Tech Co., LTD., No.498, Sec. 2, Bentian Road, An-Nan Dist., Tainan, 70955, Taiwan, R.O.C.)
,
Wen Ching-Chang
(E-Ton Solar Tech Co., LTD., No.498, Sec. 2, Bentian Road, An-Nan Dist., Tainan, 70955, Taiwan, R.O.C.)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2017
号:
PVSC
ページ:
1-3
発行年:
2017年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)