文献
J-GLOBAL ID:201802263240069887
整理番号:18A1709406
改良型光学リソグラフィー画像化モデルに基づく臨界次元変動に関する研究【JST・京大機械翻訳】
Research on critical dimensions variation based on improved optical lithography imaging model
著者 (10件):
Li Yang
(Jiangxi Engineering Research Center of Process and Equipment for New Energy, East China University of Technology, Nanchang 330013, China)
,
Li Yang
(School of Science, East China University of Technology, Nanchang 330013, China)
,
Li Yanfang
(Jiangxi Engineering Research Center of Process and Equipment for New Energy, East China University of Technology, Nanchang 330013, China)
,
Li Yanfang
(School of Science, East China University of Technology, Nanchang 330013, China)
,
Li Ying
(Jiangxi Engineering Research Center of Process and Equipment for New Energy, East China University of Technology, Nanchang 330013, China)
,
Li Ying
(School of Science, East China University of Technology, Nanchang 330013, China)
,
Li Qun
(Jiangxi Engineering Research Center of Process and Equipment for New Energy, East China University of Technology, Nanchang 330013, China)
,
Li Qun
(School of Science, East China University of Technology, Nanchang 330013, China)
,
Jiang Bifen
(Jiangxi Engineering Research Center of Process and Equipment for New Energy, East China University of Technology, Nanchang 330013, China)
,
Jiang Bifen
(School of Science, East China University of Technology, Nanchang 330013, China)
資料名:
Optik
(Optik)
巻:
174
ページ:
289-295
発行年:
2018年
JST資料番号:
D0251A
ISSN:
0030-4026
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)