文献
J-GLOBAL ID:201802263617721163
整理番号:18A1008203
微結晶GaP/Si超格子作製のための低温プラズマ増強蒸着法【JST・京大機械翻訳】
Low temperature plasma enhanced deposition approach for fabrication of microcrystalline GaP/Si superlattice
著者 (8件):
Gudovskikh Alexander S.
(Nanotechnology Centre, Saint-Petersburg Academic University, Hlopina Str. 8/3, 194021 St.-Petersburg, Russia)
,
Uvarov Alexander V.
(Nanotechnology Centre, Saint-Petersburg Academic University, Hlopina Str. 8/3, 194021 St.-Petersburg, Russia)
,
Morozov Ivan A.
(Nanotechnology Centre, Saint-Petersburg Academic University, Hlopina Str. 8/3, 194021 St.-Petersburg, Russia)
,
Baranov Artem I.
(Nanotechnology Centre, Saint-Petersburg Academic University, Hlopina Str. 8/3, 194021 St.-Petersburg, Russia)
,
Kudryashov Dmitriy A.
(Nanotechnology Centre, Saint-Petersburg Academic University, Hlopina Str. 8/3, 194021 St.-Petersburg, Russia)
,
Zelentsov Kirill S.
(Nanotechnology Centre, Saint-Petersburg Academic University, Hlopina Str. 8/3, 194021 St.-Petersburg, Russia)
,
Bukatin Anton S.
(Nanotechnology Centre, Saint-Petersburg Academic University, Hlopina Str. 8/3, 194021 St.-Petersburg, Russia)
,
Kotlyar Konstantin P.
(Nanotechnology Centre, Saint-Petersburg Academic University, Hlopina Str. 8/3, 194021 St.-Petersburg, Russia)
資料名:
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films
(Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films)
巻:
36
号:
2
ページ:
02D408-02D408-8
発行年:
2018年
JST資料番号:
C0789B
ISSN:
0734-2101
CODEN:
JVTAD6
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)