文献
J-GLOBAL ID:201802267828252991
整理番号:18A1246667
両親媒性反応溶媒を用いたサブミクロンヘキサン分散シリカ粒子のワンポット自発形成【JST・京大機械翻訳】
One-pot spontaneous formation of submicron hexane-dispersible silica particles with the aid of amphiphilic reaction solvent
著者 (3件):
Yamauchi Noriko
(Department of Materials Science and Engineering, Graduate School of Science and Engineering, Ibaraki University, 4-12-1, Nakanarusawa-cho, Hitachi, Ibaraki, 316-8511, Japan)
,
Yachi Takehiro
(Department of Applied Chemistry and Biochemistry, National Institute of Technology, Fukushima College, Nagao 30, Kamiarakawa, Taira, Iwaki, Fukushima, 970-8034, Japan)
,
Kurumada Kenichi
(Department of Applied Chemistry and Biochemistry, National Institute of Technology, Fukushima College, Nagao 30, Kamiarakawa, Taira, Iwaki, Fukushima, 970-8034, Japan)
資料名:
Colloids and Surfaces. A. Physicochemical and Engineering Aspects
(Colloids and Surfaces. A. Physicochemical and Engineering Aspects)
巻:
553
ページ:
253-258
発行年:
2018年
JST資料番号:
A0539B
ISSN:
0927-7757
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)