文献
J-GLOBAL ID:201802271162000393
整理番号:18A1131521
VUV/O_3活性化と多段階低温焼なましプロセスを用いたシリコンと石英ガラスの直接接合【JST・京大機械翻訳】
Direct bonding of silicon and quartz glass using VUV/O3 activation and a multistep low-temperature annealing process
著者 (5件):
Xu Jikai
(State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China)
,
Wang Chenxi
(State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China)
,
Wang Te
(State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China)
,
Liu Yannan
(State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China)
,
Tian Yanhong
(State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China)
資料名:
Applied Surface Science
(Applied Surface Science)
巻:
453
ページ:
416-422
発行年:
2018年
JST資料番号:
B0707B
ISSN:
0169-4332
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)