文献
J-GLOBAL ID:201802273445693634
整理番号:18A1675266
集積回路のオンチップ相互接続スタックにおける亀裂の実験室X線顕微鏡研究【JST・京大機械翻訳】
A laboratory X-ray microscopy study of cracks in on-chip interconnect stacks of integrated circuits
著者 (7件):
Kutukova K.
(Fraunhofer Institute for Ceramic Technologies and Systems, Maria-Reiche-Strasse 2, 01109 Dresden, Germany)
,
Niese S.
(Fraunhofer Institute for Ceramic Technologies and Systems, Maria-Reiche-Strasse 2, 01109 Dresden, Germany)
,
Sander C.
(Fraunhofer Institute for Ceramic Technologies and Systems, Maria-Reiche-Strasse 2, 01109 Dresden, Germany)
,
Standke Y.
(Fraunhofer Institute for Ceramic Technologies and Systems, Maria-Reiche-Strasse 2, 01109 Dresden, Germany)
,
Gluch J.
(Fraunhofer Institute for Ceramic Technologies and Systems, Maria-Reiche-Strasse 2, 01109 Dresden, Germany)
,
Gall M.
(Fraunhofer Institute for Ceramic Technologies and Systems, Maria-Reiche-Strasse 2, 01109 Dresden, Germany)
,
Zschech E.
(Fraunhofer Institute for Ceramic Technologies and Systems, Maria-Reiche-Strasse 2, 01109 Dresden, Germany)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
113
号:
9
ページ:
091901-091901-4
発行年:
2018年
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)