文献
J-GLOBAL ID:201802273912458021
整理番号:18A1138406
CF_4プラズマエッチングにより作製したナノ構造の超疎水性および反射防止表面【JST・京大機械翻訳】
Superhydrophobic and antireflective surface of nanostructures fabricated by CF4 plasma etching
著者 (5件):
Somrang W.
(Department of Physics, King Mongkut’s University of Technology Thonburi,126 Pracha Uthit Rd., Thung Khru, Bangkok 10140, Thailand)
,
Denchitcharoen S.
(Department of Physics, King Mongkut’s University of Technology Thonburi,126 Pracha Uthit Rd., Thung Khru, Bangkok 10140, Thailand)
,
Eiamchai P.
(Optical Thin-Film Laboratory, National Electronics and Computer Technology Center, 112 Thailand Science Park,Phahonyothin Rd., Klong 1, Klong Luang, Pathumthani 12120, Thailand)
,
Horprathum M.
(Optical Thin-Film Laboratory, National Electronics and Computer Technology Center, 112 Thailand Science Park,Phahonyothin Rd., Klong 1, Klong Luang, Pathumthani 12120, Thailand)
,
Chananonnawathorn C.
(Optical Thin-Film Laboratory, National Electronics and Computer Technology Center, 112 Thailand Science Park,Phahonyothin Rd., Klong 1, Klong Luang, Pathumthani 12120, Thailand)
資料名:
Materials Today: Proceedings
(Materials Today: Proceedings)
巻:
5
号:
6 P1
ページ:
13879-13885
発行年:
2018年
JST資料番号:
W3531A
ISSN:
2214-7853
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)