文献
J-GLOBAL ID:201802286905149089
整理番号:18A0718486
Cu_2O膜上のCl-誘起不動態破壊の電気化学的測定と原子論的シミュレーション【JST・京大機械翻訳】
Electrochemical measurements and atomistic simulations of Cl--induced passivity breakdown on a Cu2O film
著者 (6件):
Wei Xin
(Corrosion and Protection Center, Key Laboratory for Corrosion and Protection (MOE), University of Science and Technology Beijing, Beijing 100083, China)
,
Dong Chaofang
(Corrosion and Protection Center, Key Laboratory for Corrosion and Protection (MOE), University of Science and Technology Beijing, Beijing 100083, China)
,
Yi Pan
(Corrosion and Protection Center, Key Laboratory for Corrosion and Protection (MOE), University of Science and Technology Beijing, Beijing 100083, China)
,
Xu Aoni
(Corrosion and Protection Center, Key Laboratory for Corrosion and Protection (MOE), University of Science and Technology Beijing, Beijing 100083, China)
,
Chen Zhanghua
(School of Mathematics and Physics, University of Science and Technology Beijing, Beijing, 100083, China)
,
Li Xiaogang
(Corrosion and Protection Center, Key Laboratory for Corrosion and Protection (MOE), University of Science and Technology Beijing, Beijing 100083, China)
資料名:
Corrosion Science
(Corrosion Science)
巻:
136
ページ:
119-128
発行年:
2018年
JST資料番号:
B0135B
ISSN:
0010-938X
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)