文献
J-GLOBAL ID:201802290347562479
整理番号:18A1008184
プラズマ増強原子層堆積により合成した二酸化チタンの膜特性に及ぼすイオンエネルギーの影響【JST・京大機械翻訳】
Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
著者 (7件):
Iwashita Shinya
(TFF Development Business Division, Tokyo Electron Technology Solutions Ltd., 407-0192 Nirasaki, Japan)
,
Moriya Tsuyoshi
(TFF Development Business Division, Tokyo Electron Technology Solutions Ltd., 407-0192 Nirasaki, Japan)
,
Kikuchi Takamichi
(TFF Development Business Division, Tokyo Electron Technology Solutions Ltd., 407-0192 Nirasaki, Japan)
,
Kagaya Munehito
(TFF Development Business Division, Tokyo Electron Technology Solutions Ltd., 407-0192 Nirasaki, Japan)
,
Noro Naotaka
(TFF Development Business Division, Tokyo Electron Technology Solutions Ltd., 407-0192 Nirasaki, Japan)
,
Hasegawa Toshio
(TFF Development Business Division, Tokyo Electron Technology Solutions Ltd., 407-0192 Nirasaki, Japan)
,
Uedono Akira
(Division of Applied Physics, Faculty of Pure and Applied Science, University of Tsukuba, 305-8573 Tsukuba, Japan)
資料名:
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films
(Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films)
巻:
36
号:
2
ページ:
021515-021515-8
発行年:
2018年
JST資料番号:
C0789B
ISSN:
0734-2101
CODEN:
JVTAD6
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)