文献
J-GLOBAL ID:201902217544009021
整理番号:19A2367024
金属基板上の酸化物薄膜の局所仕事関数測定【JST・京大機械翻訳】
Local Work Function Measurements of Thin Oxide Films on Metal Substrates
著者 (9件):
Huang Zhichao
(BNLMS, College of Chemistry and Molecular Engineering, Peking University, China)
,
Xu Zhen
(BNLMS, College of Chemistry and Molecular Engineering, Peking University, China)
,
Zhou Junyi
(BNLMS, College of Chemistry and Molecular Engineering, Peking University, China)
,
Chen Haoran
(BNLMS, College of Chemistry and Molecular Engineering, Peking University, China)
,
Rong Wenhui
(BNLMS, College of Chemistry and Molecular Engineering, Peking University, China)
,
Lin Yuxuan
(BNLMS, College of Chemistry and Molecular Engineering, Peking University, China)
,
Wen Xiaojie
(BNLMS, College of Chemistry and Molecular Engineering, Peking University, China)
,
Zhu Hao
(BNLMS, College of Chemistry and Molecular Engineering, Peking University, China)
,
Wu Kai
(BNLMS, College of Chemistry and Molecular Engineering, Peking University, China)
資料名:
Journal of Physical Chemistry C
(Journal of Physical Chemistry C)
巻:
123
号:
29
ページ:
17823-17828
発行年:
2019年
JST資料番号:
W1877A
ISSN:
1932-7447
CODEN:
JPCCCK
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)