文献
J-GLOBAL ID:201902226993248664
整理番号:19A1456984
ニッケル-グラフェン界面によるヘリウム関連クラスタの放出 原子論的研究【JST・京大機械翻訳】
Release of helium-related clusters through a nickel-graphene interface: An atomistic study
著者 (10件):
Huang Hai
(Department of Nuclear Science & Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China)
,
Huang Hai
(Department of Nuclear Engineering and Radiological Science, University of Michigan, Ann Arbor, MI 48109, USA)
,
Tang Xiaobin
(Department of Nuclear Science & Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China)
,
Tang Xiaobin
(Jiangsu Engineering Laboratory of Nuclear Energy Equipment Materials, Nanjing 210016, China)
,
Gao Fei
(Department of Nuclear Engineering and Radiological Science, University of Michigan, Ann Arbor, MI 48109, USA)
,
Chen Feida
(Department of Nuclear Science & Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China)
,
Chen Feida
(Jiangsu Engineering Laboratory of Nuclear Energy Equipment Materials, Nanjing 210016, China)
,
Ge Guojia
(Department of Nuclear Science & Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China)
,
Yan Yuanyuan
(Department of Nuclear Science & Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China)
,
Peng Qing
(Department of Nuclear Engineering and Radiological Science, University of Michigan, Ann Arbor, MI 48109, USA)
資料名:
Applied Surface Science
(Applied Surface Science)
巻:
487
ページ:
218-227
発行年:
2019年
JST資料番号:
B0707B
ISSN:
0169-4332
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)