文献
J-GLOBAL ID:201902227729744625
整理番号:19A1893338
半乾燥金属アセチルアセトナート層の逆オフセット印刷とその溶液処理IGZO TFT作製への応用【JST・京大機械翻訳】
Reverse Offset Printing of Semidried Metal Acetylacetonate Layers and Its Application to a Solution-Processed IGZO TFT Fabrication
著者 (8件):
Kusaka Yasuyuki
(Flexible Electronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Ibaraki, Japan)
,
Shirakawa Naoki
(Flexible Electronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Ibaraki, Japan)
,
Ogura Shintaro
(Flexible Electronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Ibaraki, Japan)
,
Leppaeniemi Jaakko
(VTT Technical Research Centre of Finland Ltd., Finland)
,
Sneck Asko
(VTT Technical Research Centre of Finland Ltd., Finland)
,
Alastalo Ari
(VTT Technical Research Centre of Finland Ltd., Finland)
,
Ushijima Hirobumi
(Flexible Electronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Ibaraki, Japan)
,
Fukuda Nobuko
(Flexible Electronics Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Ibaraki, Japan)
資料名:
ACS Applied Materials & Interfaces
(ACS Applied Materials & Interfaces)
巻:
10
号:
29
ページ:
24339-24343
発行年:
2018年
JST資料番号:
W2329A
ISSN:
1944-8244
CODEN:
AAMICK
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)