文献
J-GLOBAL ID:201902234877056402
整理番号:19A0511436
異なるターゲットサイズの超伝導ニオブ窒化チタン薄膜の反応性マグネトロンスパッタ蒸着【JST・京大機械翻訳】
Reactive Magnetron Sputter Deposition of Superconducting Niobium Titanium Nitride Thin Films With Different Target Sizes
著者 (7件):
Bos Boy Gustaaf Cornelis
(Kavli Institute of Nanoscience, Faculty of Applied Sciences, Delft University of Technology, Delft, CJ, The Netherlands)
,
Thoen David Johannes
(Kavli Institute of Nanoscience, Faculty of Applied Sciences and the Department of Electrical Engineering, Faculty of Electrical Engineering, Mathematics and Computer Science, Delft University of Technology, Delft, CD, The Netherlands)
,
Haalebos E. A. F.
(Netherlands Institute for Space Research, Utrecht, 3584, CA, The Netherlands)
,
Gimbel P. M. L.
(Kavli Institute of Nanoscience, Faculty of Applied Sciences, Delft University of Technology, Delft, CJ, The Netherlands)
,
Klapwijk T. M.
(Kavli Institute of Nanoscience, Faculty of Applied Sciences, Delft University of Technology, Delft, CJ, The Netherlands)
,
Baselmans J. J. A.
(Department of Electrical Engineering, Faculty of Electrical Engineering, Mathematics and Computer Science, Delft University of Technology, Delft, CD, The Netherlands)
,
Endo Akira
(Kavli Institute of Nanoscience, Faculty of Applied Sciences and the Department of Electrical Engineering, Faculty of Electrical Engineering, Mathematics and Computer Science, Delft University of Technology, Delft, CD, The Netherlands)
資料名:
IEEE Transactions on Applied Superconductivity
(IEEE Transactions on Applied Superconductivity)
巻:
27
号:
4
ページ:
1-5
発行年:
2017年
JST資料番号:
W0177A
ISSN:
1051-8223
CODEN:
ITASE9
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)