文献
J-GLOBAL ID:201902236369538904
整理番号:19A0128939
コバルトアミジナートによる窒化コバルトのプラズマ増強原子層堆積【JST・京大機械翻訳】
Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
著者 (7件):
Fan Qipeng
(Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China)
,
Sang Lijun
(Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China)
,
Jiang Derong
(Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China)
,
Yang Lizhen
(Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China)
,
Zhang Haibao
(Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China)
,
Chen Qiang
(Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China)
,
Liu Zhongwei
(Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China)
資料名:
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films
(Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films)
巻:
37
号:
1
ページ:
010904-010904-7
発行年:
2019年
JST資料番号:
C0789B
ISSN:
0734-2101
CODEN:
JVTAD6
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)