文献
J-GLOBAL ID:201902258858915002
整理番号:19A1811958
水素化非晶質シリコンの高圧閉じ込め化学蒸着におけるシラン分解の動力学【JST・京大機械翻訳】
Kinetics of Silane Decomposition in High-Pressure Confined Chemical Vapor Deposition of Hydrogenated Amorphous Silicon
著者 (7件):
Motevalian Seyed Pouria
(Department of Chemical Engineering, The Pennsylvania State University)
,
Aro Stephen C.
(Department of Chemistry, The Pennsylvania State University)
,
Cheng Hiu Y.
(Department of Chemistry, The Pennsylvania State University)
,
Day Todd D.
(Department of Chemistry, The Pennsylvania State University)
,
van Duin Adri C. T.
(Department of Mechanical and Nuclear Engineering, The Pennsylvania State University)
,
Badding John V.
(Department of Chemistry, The Pennsylvania State University)
,
Borhan Ali
(Department of Chemical Engineering, The Pennsylvania State University)
資料名:
Industrial & Engineering Chemistry Research
(Industrial & Engineering Chemistry Research)
巻:
56
号:
51
ページ:
14995-15000
発行年:
2017年
JST資料番号:
C0385C
ISSN:
0888-5885
CODEN:
IECRED
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)