文献
J-GLOBAL ID:201902258995801527
整理番号:19A1415137
超薄膜応用のための膜貫通電子ビームリソグラフィー【JST・京大機械翻訳】
Through-membrane electron-beam lithography for ultrathin membrane applications
著者 (9件):
Neklyudova M.
(Kavli Institute of Nanoscience, Delft University of Technology, Delft 2628CJ, the Netherlands)
,
Erdamar A. K.
(Kavli Institute of Nanoscience, Delft University of Technology, Delft 2628CJ, the Netherlands)
,
Vicarelli L.
(Kavli Institute of Nanoscience, Delft University of Technology, Delft 2628CJ, the Netherlands)
,
Heerema S. J.
(Kavli Institute of Nanoscience, Delft University of Technology, Delft 2628CJ, the Netherlands)
,
Rehfeldt T.
(Kavli Institute of Nanoscience, Delft University of Technology, Delft 2628CJ, the Netherlands)
,
Pandraud G.
(Else Kooi Laboratory, Delft University of Technology, Delft 2628CT, the Netherlands)
,
Kolahdouz Z.
(Kavli Institute of Nanoscience, Delft University of Technology, Delft 2628CJ, the Netherlands)
,
Dekker C.
(Kavli Institute of Nanoscience, Delft University of Technology, Delft 2628CJ, the Netherlands)
,
Zandbergen H. W.
(Kavli Institute of Nanoscience, Delft University of Technology, Delft 2628CJ, the Netherlands)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
111
号:
6
ページ:
063105-063105-5
発行年:
2017年
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)