文献
J-GLOBAL ID:201902258997680431
整理番号:19A2090778
加熱イオン注入による注入SOIの温度誘起脱濡れの防止【JST・京大機械翻訳】
Prevention of Temperature-Induced Dewetting of Implanted SOI via Heated Ion Implantation
著者 (12件):
Borrel Julien
(STMicroelectronics, Crolles, France)
,
Gauthier Alexis
(STMicroelectronics, Crolles, France)
,
Deprat Fabien
(STMicroelectronics, Crolles, France)
,
Lu Vincent
(Applied Materials, Gloucester, MA, USA)
,
Abbate Francesco
(STMicroelectronics, Crolles, France)
,
Joblot Sylvain
(STMicroelectronics, Crolles, France)
,
Clement Laurent-Renaud
(STMicroelectronics, Crolles, France)
,
Tupin Heloise
(STMicroelectronics, Crolles, France)
,
Zou Wei
(Applied Materials, Gloucester, MA, USA)
,
Arevalo Edwin
(Applied Materials, Gloucester, MA, USA)
,
Chevalier Pascal
(STMicroelectronics, Crolles, France)
,
Dutartre Didier
(STMicroelectronics, Crolles, France)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2018
号:
IIT
ページ:
29-32
発行年:
2018年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)