文献
J-GLOBAL ID:201902263584826433
整理番号:19A1415264
弱く相互作用する基板上の薄膜成長中の伸び遷移厚さのスケーリング【JST・京大機械翻訳】
Scaling of elongation transition thickness during thin-film growth on weakly interacting substrates
著者 (4件):
Lue B.
(Nanoscale Engineering Division, Department of Physics, Chemistry and Biology, Linkoping University, SE 581 83 Linkoping, Sweden)
,
Souqui L.
(Nanoscale Engineering Division, Department of Physics, Chemistry and Biology, Linkoping University, SE 581 83 Linkoping, Sweden)
,
Elofsson V.
(Nanoscale Engineering Division, Department of Physics, Chemistry and Biology, Linkoping University, SE 581 83 Linkoping, Sweden)
,
Sarakinos K.
(Nanoscale Engineering Division, Department of Physics, Chemistry and Biology, Linkoping University, SE 581 83 Linkoping, Sweden)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
111
号:
8
ページ:
084101-084101-5
発行年:
2017年
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)