文献
J-GLOBAL ID:201902275400136138
整理番号:19A0511473
大規模集積ディジタル回路のためのNb/Al-AlOx/Nbトンネル接合の開発【JST・京大機械翻訳】
Development of Nb/Al-AlOx/Nb Tunnel Junction for Large-Scale Integrated Digital Circuits
著者 (6件):
Xiong Wei
(Shanghai Institute of Microsystem and Information Technology and the Center for Excellence in Superconducting Electronics, Chinese Academy of Sciences, Shanghai, China)
,
Ying Liliang
(Shanghai Institute of Microsystem and Information Technology and the Center for Excellence in Superconducting Electronics, Chinese Academy of Sciences, Shanghai, China)
,
Wu Yu
(Shanghai Institute of Microsystem and Information Technology and the Center for Excellence in Superconducting Electronics, Chinese Academy of Sciences, Shanghai, China)
,
Ren Jie
(Shanghai Institute of Microsystem and Information Technology and the Center for Excellence in Superconducting Electronics, Chinese Academy of Sciences, Shanghai, China)
,
Peng Wei
(Shanghai Institute of Microsystem and Information Technology and the Center for Excellence in Superconducting Electronics, Chinese Academy of Sciences, Shanghai, China)
,
Wang Zhen
(Shanghai Institute of Microsystem and Information Technology and the Center for Excellence in Superconducting Electronics, Chinese Academy of Sciences, Shanghai, China)
資料名:
IEEE Transactions on Applied Superconductivity
(IEEE Transactions on Applied Superconductivity)
巻:
27
号:
4
ページ:
ROMBUNNO.1100304.1-4
発行年:
2017年
JST資料番号:
W0177A
ISSN:
1051-8223
CODEN:
ITASE9
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)