文献
J-GLOBAL ID:201902279532063651
整理番号:19A1413446
熱アニールした高χブロック共重合体薄膜における垂直ラメラの初期無秩序発展の直接その場観察【JST・京大機械翻訳】
Direct In Situ Observation of the Early-Stage Disorder-Order Evolution of Perpendicular Lamellae in Thermally Annealed High-χ Block Copolymer Thin Films
著者 (8件):
Chandra Alvin
(Department of Materials Science and Engineering, Tokyo Institute of Technology, 2-12-1-S8-36 Ookayama, Meguro-ku, Tokyo, 152-8552, Japan)
,
Nakatani Ryuichi
(Department of Materials Science and Engineering, Tokyo Institute of Technology, 2-12-1-S8-36 Ookayama, Meguro-ku, Tokyo, 152-8552, Japan)
,
Uchiyama Takumi
(Department of Materials Science and Engineering, Tokyo Institute of Technology, 2-12-1-S8-36 Ookayama, Meguro-ku, Tokyo, 152-8552, Japan)
,
Seino Yuriko
(Evolving Nano-process Infrastructure Development Center, 16-1 Onogawa, Tsukuba-shi, Ibaraki, 305-8569, Japan)
,
Sato Hironobu
(Evolving Nano-process Infrastructure Development Center, 16-1 Onogawa, Tsukuba-shi, Ibaraki, 305-8569, Japan)
,
Kasahara Yusuke
(Evolving Nano-process Infrastructure Development Center, 16-1 Onogawa, Tsukuba-shi, Ibaraki, 305-8569, Japan)
,
Azuma Tsukasa
(Evolving Nano-process Infrastructure Development Center, 16-1 Onogawa, Tsukuba-shi, Ibaraki, 305-8569, Japan)
,
Hayakawa Teruaki
(Department of Materials Science and Engineering, Tokyo Institute of Technology, 2-12-1-S8-36 Ookayama, Meguro-ku, Tokyo, 152-8552, Japan)
資料名:
Advanced Materials Interfaces
(Advanced Materials Interfaces)
巻:
6
号:
11
ページ:
e1801401
発行年:
2019年
JST資料番号:
W2484A
ISSN:
2196-7350
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)