文献
J-GLOBAL ID:201902287351870158
整理番号:19A1415497
硬X線光電子分光法におけるバックグラウンド解析により決定した薄膜の厚さと構造【JST・京大機械翻訳】
Thickness and structure of thin films determined by background analysis in hard X-ray photoelectron spectroscopy
著者 (10件):
Cui Yi-Tao
(Japan Synchrotron Radiation Institute, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan)
,
Tougaard Sven
(Department of Physics, Chemistry and Pharmacy, University of Southern Denmark, DK-5230 Odense M, Denmark)
,
Oji Hiroshi
(Japan Synchrotron Radiation Institute, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan)
,
Son Jin-Young
(Japan Synchrotron Radiation Institute, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan)
,
Sakamoto Yasuhiro
(Nanoscience and Nanotechnology Research Center, Research Organization for the 21st Century, Osaka Prefecture University, 1-2 Gakuen-cho, Naka-ku, Sakai 599-8570, Japan)
,
Matsumoto Takuya
(Japan Synchrotron Radiation Institute, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan)
,
Yang Anli
(Synchrotron X-ray Station at SPring-8, National Institute for Materials Science, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5148, Japan)
,
Sakata Osami
(Synchrotron X-ray Station at SPring-8, National Institute for Materials Science, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5148, Japan)
,
Song Huaping
(Research Institute, Kochi University of Technology, Kami, Kochi 782-8502, Japan)
,
Hirosawa Ichiro
(Japan Synchrotron Radiation Institute, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan)
資料名:
Journal of Applied Physics
(Journal of Applied Physics)
巻:
121
号:
22
ページ:
225307-225307-10
発行年:
2017年
JST資料番号:
C0266A
ISSN:
0021-8979
CODEN:
JAPIAU
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)