文献
J-GLOBAL ID:201902291256416912
整理番号:19A2210197
パルスDC PECVDプロセスを用いた狭い管内の硬質窒化チタン被覆堆積【JST・京大機械翻訳】
Hard titanium nitride coating deposition inside narrow tubes using pulsed DC PECVD processes
著者 (6件):
Kilicaslan A.
(Department of Engineering Physics, Polytechnique Montreal, Montreal, QC H3C-3A7, Canada)
,
Zabeida O.
(Department of Engineering Physics, Polytechnique Montreal, Montreal, QC H3C-3A7, Canada)
,
Bousser E.
(Department of Engineering Physics, Polytechnique Montreal, Montreal, QC H3C-3A7, Canada)
,
Schmitt T.
(Department of Engineering Physics, Polytechnique Montreal, Montreal, QC H3C-3A7, Canada)
,
Klemberg-Sapieha J.E.
(Department of Engineering Physics, Polytechnique Montreal, Montreal, QC H3C-3A7, Canada)
,
Martinu L.
(Department of Engineering Physics, Polytechnique Montreal, Montreal, QC H3C-3A7, Canada)
資料名:
Surface & Coatings Technology
(Surface & Coatings Technology)
巻:
377
ページ:
Null
発行年:
2019年
JST資料番号:
D0205C
ISSN:
0257-8972
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)