文献
J-GLOBAL ID:202002210631212416
整理番号:20A1107920
低速動力学間欠スパッタリングを用いた薄膜成長の改善【JST・京大機械翻訳】
Improved thin film growth using Slow Kinetics Intermittent Sputtering
著者 (6件):
Weymann Christian
(Department of Quantum Matter Physics, University of Geneva, 24 Quai Ernest-Ansermet, CH-1211 Geneva 4, Switzerland)
,
Lichtensteiger Celine
(Department of Quantum Matter Physics, University of Geneva, 24 Quai Ernest-Ansermet, CH-1211 Geneva 4, Switzerland)
,
Fernandez-Pena Stephanie
(Department of Quantum Matter Physics, University of Geneva, 24 Quai Ernest-Ansermet, CH-1211 Geneva 4, Switzerland)
,
Fernandez-Pena Stephanie
(Now at: European Organization for Nuclear Research (CERN), CH-1211 Geneva 23, Switzerland)
,
Cordero-Edwards Kumara
(Department of Quantum Matter Physics, University of Geneva, 24 Quai Ernest-Ansermet, CH-1211 Geneva 4, Switzerland)
,
Paruch Patrycja
(Department of Quantum Matter Physics, University of Geneva, 24 Quai Ernest-Ansermet, CH-1211 Geneva 4, Switzerland)
資料名:
Applied Surface Science
(Applied Surface Science)
巻:
516
ページ:
Null
発行年:
2020年
JST資料番号:
B0707B
ISSN:
0169-4332
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)