文献
J-GLOBAL ID:202002215574580927
整理番号:20A1884128
紫外/オゾンプラズマ処理界面を有する金属-Al2O3-GaNキャパシタ
Metal-Al2O3-GaN capacitors with an ultraviolet/ozone plasma-treated interface
著者 (6件):
Kim Kwangeun
(Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Madison, WI 53706, United States of America)
,
Kim Kwangeun
(Department of Electronic and Electrical Convergence Engineering, Hongik University, Sejong 30016, Republic of Korea)
,
Kim Jisoo
(Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Madison, WI 53706, United States of America)
,
Gong Jiarui
(Department of Physics, University of Wisconsin-Madison, Madison, WI 53706, United States of America)
,
Liu Dong
(Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Madison, WI 53706, United States of America)
,
Ma Zhenqiang
(Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Madison, WI 53706, United States of America)
資料名:
Japanese Journal of Applied Physics
(Japanese Journal of Applied Physics)
巻:
59
号:
3
ページ:
030908 (5pp)
発行年:
2020年03月
JST資料番号:
G0520B
ISSN:
0021-4922
CODEN:
JJAPB6
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
イギリス (GBR)
言語:
英語 (EN)