文献
J-GLOBAL ID:202002217156417803
整理番号:20A0377976
高アスペクト比シリコンピラーの非スイッチング擬似ボッシュエッチングに及ぼす酸素プラズマ洗浄の影響【JST・京大機械翻訳】
Effect of oxygen plasma cleaning on nonswitching pseudo-Bosch etching of high aspect ratio silicon pillars
著者 (4件):
Aydinoglu Ferhat
(Department of Electrical and Computer Engineering, Waterloo Institute for Nanotechnology (WIN), University of Waterloo, 200 University Ave. West, Waterloo, Ontario N2L 3G1, Canada)
,
Pan Aixi
(Department of Electrical and Computer Engineering, Waterloo Institute for Nanotechnology (WIN), University of Waterloo, 200 University Ave. West, Waterloo, Ontario N2L 3G1, Canada)
,
Zhu Chenxu
(Department of Electrical and Computer Engineering, Waterloo Institute for Nanotechnology (WIN), University of Waterloo, 200 University Ave. West, Waterloo, Ontario N2L 3G1, Canada)
,
Cui Bo
(Department of Electrical and Computer Engineering, Waterloo Institute for Nanotechnology (WIN), University of Waterloo, 200 University Ave. West, Waterloo, Ontario N2L 3G1, Canada)
資料名:
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
(Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena)
巻:
38
号:
1
ページ:
012804-012804-5
発行年:
2020年
JST資料番号:
E0974A
ISSN:
2166-2746
CODEN:
JVTBD9
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)