文献
J-GLOBAL ID:202002219373549277
整理番号:20A0742723
NO分子によるh-BN単分子層におけるN空孔の治癒のDFT研究【JST・京大機械翻訳】
A DFT study of healing the N vacancy in h-BN monolayer by NO molecules
著者 (4件):
Cui Hao
(College of Artificial Intelligence, Southwest University, Chongqing, China)
,
Cui Hao
(State Key Laboratory of Power Transmission Equipment and System Security and New Technology, Chongqing University, Chongqing, China)
,
Liu Tun
(Traffic and Transportation Engineering, Central South University, Changsha, China)
,
Jia Pengfei
(College of Artificial Intelligence, Southwest University, Chongqing, China)
資料名:
Applied Physics. A. Materials Science & Processing
(Applied Physics. A. Materials Science & Processing)
巻:
126
号:
4
ページ:
292
発行年:
2020年
JST資料番号:
D0256C
ISSN:
0947-8396
CODEN:
APHYCC
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
ドイツ (DEU)
言語:
英語 (EN)