文献
J-GLOBAL ID:202002220223096260
整理番号:20A0576884
NILテンプレート作製のための混合および整合リソグラフィーと低温エッチング【JST・京大機械翻訳】
Mix-and-match lithography and cryogenic etching for NIL template fabrication
著者 (9件):
Hofmann Martin
(Ilmenau University of Technology, Department of Micro- and Nanoelectronic Systems, Gustav-Kirchhoff-Str. 1, 98693 Ilmenau, Germany)
,
Weidenfeller Laura
(Ilmenau University of Technology, Institute for Process Measurement and Sensor Technology, Gustav-Kirchhoff-Str. 1, 98693 Ilmenau, Germany)
,
Supreeti Shraddha
(Ilmenau University of Technology, Department of Microsystems Technology, Max-Planck-Ring 12, 98693 Ilmenau, Germany)
,
Mechold Stephan
(Ilmenau University of Technology, Department of Micro- and Nanoelectronic Systems, Gustav-Kirchhoff-Str. 1, 98693 Ilmenau, Germany)
,
Holz Mathias
(nano analytik GmbH, Ehrenbergstr. 1, 98693 Ilmenau, Germany)
,
Reuter Christoph
(nano analytik GmbH, Ehrenbergstr. 1, 98693 Ilmenau, Germany)
,
Sinzinger Stefan
(Ilmenau University of Technology, Department of Technical Optics, Helmholtzring 1, 98693 Ilmenau, Germany)
,
Manske Eberhard
(Ilmenau University of Technology, Institute for Process Measurement and Sensor Technology, Gustav-Kirchhoff-Str. 1, 98693 Ilmenau, Germany)
,
Rangelow Ivo W.
(Ilmenau University of Technology, Department of Micro- and Nanoelectronic Systems, Gustav-Kirchhoff-Str. 1, 98693 Ilmenau, Germany)
資料名:
Microelectronic Engineering
(Microelectronic Engineering)
巻:
224
ページ:
Null
発行年:
2020年
JST資料番号:
C0406B
ISSN:
0167-9317
CODEN:
MIENEF
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)