文献
J-GLOBAL ID:202002225647490607
整理番号:20A2698765
シリコン基板上の超高アスペクト比ナノ壁とナノ構造の作製【JST・京大機械翻訳】
Fabrication of ultra-high-aspect-ratio nano-walls and nano-structures on silicon substrates
著者 (4件):
Pournia Mahsa
(School of Electrical and Computer Engineering, College of Engineering, University of Tehran, Tehran, Iran)
,
Firoozabadi Seyed Ahmadreza
(School of Electrical and Computer Engineering, College of Engineering, University of Tehran, Tehran, Iran)
,
Fathipour Morteza
(School of Electrical and Computer Engineering, College of Engineering, University of Tehran, Tehran, Iran)
,
Kolahdouz Mohammadreza
(School of Electrical and Computer Engineering, College of Engineering, University of Tehran, Tehran, Iran)
資料名:
Journal of Micromechanics and Microengineering
(Journal of Micromechanics and Microengineering)
巻:
30
号:
12
ページ:
125008 (11pp)
発行年:
2020年
JST資料番号:
W1424A
ISSN:
0960-1317
CODEN:
JMMIEZ
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)