文献
J-GLOBAL ID:202002230994156673
整理番号:20A0298978
多層WSe_2におけるバンドギャップ発展とキャリア再分布の解明:熱工学による増強光子放出【JST・京大機械翻訳】
Unveiling Bandgap Evolution and Carrier Redistribution in Multilayer WSe2: Enhanced Photon Emission via Heat Engineering
著者 (15件):
Li Yuanzheng
(Centre for Advanced Optoelectronic Functional Materials Research and Key Laboratory of UV-Emitting Materials and Technology (Northeast Normal University), Ministry of Education, Changchun, 130024, China)
,
Li Yuanzheng
(CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, China)
,
Liu Weizhen
(Centre for Advanced Optoelectronic Functional Materials Research and Key Laboratory of UV-Emitting Materials and Technology (Northeast Normal University), Ministry of Education, Changchun, 130024, China)
,
Xu Haiyang
(Centre for Advanced Optoelectronic Functional Materials Research and Key Laboratory of UV-Emitting Materials and Technology (Northeast Normal University), Ministry of Education, Changchun, 130024, China)
,
Chen Heyu
(Centre for Advanced Optoelectronic Functional Materials Research and Key Laboratory of UV-Emitting Materials and Technology (Northeast Normal University), Ministry of Education, Changchun, 130024, China)
,
Ren Hang
(Centre for Advanced Optoelectronic Functional Materials Research and Key Laboratory of UV-Emitting Materials and Technology (Northeast Normal University), Ministry of Education, Changchun, 130024, China)
,
Shi Jia
(CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, China)
,
Du Wenna
(CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, China)
,
Du Wenna
(Key Laboratory of Semiconductor Materials Science, Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, 100083, China)
,
Zhang Wei
(Centre for Advanced Optoelectronic Functional Materials Research and Key Laboratory of UV-Emitting Materials and Technology (Northeast Normal University), Ministry of Education, Changchun, 130024, China)
,
Feng Qiushi
(Centre for Advanced Optoelectronic Functional Materials Research and Key Laboratory of UV-Emitting Materials and Technology (Northeast Normal University), Ministry of Education, Changchun, 130024, China)
,
Yan Jiaxu
(Centre for Advanced Optoelectronic Functional Materials Research and Key Laboratory of UV-Emitting Materials and Technology (Northeast Normal University), Ministry of Education, Changchun, 130024, China)
,
Zhang Cen
(Centre for Advanced Optoelectronic Functional Materials Research and Key Laboratory of UV-Emitting Materials and Technology (Northeast Normal University), Ministry of Education, Changchun, 130024, China)
,
Liu Yichun
(Centre for Advanced Optoelectronic Functional Materials Research and Key Laboratory of UV-Emitting Materials and Technology (Northeast Normal University), Ministry of Education, Changchun, 130024, China)
,
Liu Xinfeng
(CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, China)
資料名:
Advanced Optical Materials
(Advanced Optical Materials)
巻:
8
号:
2
ページ:
e1901226
発行年:
2020年
JST資料番号:
W2486A
ISSN:
2195-1071
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)