文献
J-GLOBAL ID:202002232766455172
整理番号:20A2138589
タンニンニッケル鉄錯体の被覆によるWO_3/BiVO_4ヘテロ接合の光電気化学活性と安定性の促進【JST・京大機械翻訳】
Promoting Photoelectrochemical Activity and Stability of WO3/BiVO4 Heterojunctions by Coating a Tannin Nickel Iron Complex
著者 (4件):
Sun Huanhuan
(State Key Laboratory of Solidification Processing, Center for Nano Energy Materials, School of Materials Science and Engineering, Northwestern Polytechnical University and Shaanxi Joint Lab of Graphene (NPU), P. R. China)
,
Hua Wei
(State Key Laboratory of Solidification Processing, Center for Nano Energy Materials, School of Materials Science and Engineering, Northwestern Polytechnical University and Shaanxi Joint Lab of Graphene (NPU), P. R. China)
,
Li Yueying
(New Energy (Photovoltaic) Industry Research Center, Qinghai University, P. R. China)
,
Wang Jian-Gan
(State Key Laboratory of Solidification Processing, Center for Nano Energy Materials, School of Materials Science and Engineering, Northwestern Polytechnical University and Shaanxi Joint Lab of Graphene (NPU), P. R. China)
資料名:
ACS Sustainable Chemistry & Engineering
(ACS Sustainable Chemistry & Engineering)
巻:
8
号:
33
ページ:
12637-12645
発行年:
2020年
JST資料番号:
W5047A
ISSN:
2168-0485
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)