文献
J-GLOBAL ID:202002241162854249
整理番号:20A2629070
ハイブリッド高出力インパルスと高周波マグネトロン共スパッタリングを用いたCr-Si-N被覆の作製:Si取込みとデューティサイクルの役割【JST・京大機械翻訳】
Fabrication of Cr-Si-N coatings using a hybrid high-power impulse and radio-frequency magnetron co-sputtering: The role of Si incorporation and duty cycle
著者 (6件):
Diyatmika Wahyu
(Department of Precision Surfaces, Leibniz Institute of Surface Engineering (IOM), Leipzig, Germany)
,
Cheng Chih-Yuan
(Department of Materials Engineering, Ming Chi University of Technology, New Taipei City, Taiwan)
,
Lee Jyh-Wei
(Department of Materials Engineering, Ming Chi University of Technology, New Taipei City, Taiwan)
,
Lee Jyh-Wei
(Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei City, Taiwan)
,
Lee Jyh-Wei
(Department of Mechanical Engineering, Chang Gung University, Taoyuan, Taiwan)
,
Lee Jyh-Wei
(Plastic and Reconstructive Surgery, and Craniofacial Research Center, Chang Gung Memorial Hospital, Taoyuan, Taiwan)
資料名:
Surface & Coatings Technology
(Surface & Coatings Technology)
巻:
403
ページ:
Null
発行年:
2020年
JST資料番号:
D0205C
ISSN:
0257-8972
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)