文献
J-GLOBAL ID:202002245834082360
整理番号:20A1235489
NH3流量変調エピタクシーにより成長させたAlGaN/AlN超格子における界面の改善
Improvement of the interfaces in AlGaN/AlN superlattice grown by NH3 flow-rate modulation epitaxy
著者 (10件):
Luo Weike
(Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, People’s Republic of China)
,
Luo Weike
(Science and Technology on Monolithic Integrated Circuits and Modules Laboratory, Nanjing Electronic Devices Institute, Nanjing 210016, People’s Republic of China)
,
Bin Liu
(Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, People’s Republic of China)
,
Li Zhonghui
(Science and Technology on Monolithic Integrated Circuits and Modules Laboratory, Nanjing Electronic Devices Institute, Nanjing 210016, People’s Republic of China)
,
Yang Feng
(Science and Technology on Monolithic Integrated Circuits and Modules Laboratory, Nanjing Electronic Devices Institute, Nanjing 210016, People’s Republic of China)
,
Li Zhenhua
(Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, People’s Republic of China)
,
Yang Qiankun
(Science and Technology on Monolithic Integrated Circuits and Modules Laboratory, Nanjing Electronic Devices Institute, Nanjing 210016, People’s Republic of China)
,
Gao Hanchao
(Science and Technology on Monolithic Integrated Circuits and Modules Laboratory, Nanjing Electronic Devices Institute, Nanjing 210016, People’s Republic of China)
,
Wang Kechao
(Science and Technology on Monolithic Integrated Circuits and Modules Laboratory, Nanjing Electronic Devices Institute, Nanjing 210016, People’s Republic of China)
,
Zhang Rong
(Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, People’s Republic of China)
資料名:
Applied Physics Express
(Applied Physics Express)
巻:
13
号:
1
ページ:
015511 (5pp)
発行年:
2020年01月
JST資料番号:
F0599C
ISSN:
1882-0778
CODEN:
APEPC4
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
イギリス (GBR)
言語:
英語 (EN)